Passivated Tunneling Contacts to N-Type Wafer Silicon and Their Implementation into High Performance Solar Cells: Preprint

Pauls Stradins, William Nemeth, David Young, Andrew Norman, Yuanyue Liu, Emily Warren, Vincenzo LaSalvia, Matthew Page, Ajeet Rohatgi, Stefan Glunz, Jan Benick, Ajay Upadhyaya, Brian Rounsaville, Martin Hermle, Y.-W. Ok, Arrelaine Dameron

Research output: Contribution to conferencePaper

Abstract

We present a case that passivated contacts based on a thin tunneling oxide layer, combined with a transport layer with properly selected work function and band offsets, can lead to high efficiency c-Si solar cells. Passivated contacts contribute to cell efficiency as well as design flexibility, process robustness, and a simplified process flow. Material choices for the transport layer areexamined, including transparent n-type oxides and n+-doped poly-Si. SiO2/n+-poly-Si full-area, induced-junction back surface field contacts to n-FZ and n-Cz Si are incorporated into high efficiency cells with deep, passivated boron emitters.
Original languageAmerican English
Number of pages6
StatePublished - 2014
EventWCPEC-6: 6th World Conference on Photovoltaic Energy Conversion - Kyoto, Japan
Duration: 23 Nov 201427 Nov 2014

Conference

ConferenceWCPEC-6: 6th World Conference on Photovoltaic Energy Conversion
CityKyoto, Japan
Period23/11/1427/11/14

NREL Publication Number

  • NREL/CP-5J00-63259

Keywords

  • boron
  • N+ doped polysilicon
  • n-type oxides
  • passivated contacts
  • silicon solar cells
  • tunneling oxide

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