Abstract
We present a case that passivated contacts based on a thin tunneling oxide layer, combined with a transport layer with properly selected work function and band offsets, can lead to high efficiency c-Si solar cells. Passivated contacts contribute to cell efficiency as well as design flexibility, process robustness, and a simplified process flow. Material choices for the transport layer areexamined, including transparent n-type oxides and n+-doped poly-Si. SiO2/n+-poly-Si full-area, induced-junction back surface field contacts to n-FZ and n-Cz Si are incorporated into high efficiency cells with deep, passivated boron emitters.
Original language | American English |
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Number of pages | 6 |
State | Published - 2014 |
Event | WCPEC-6: 6th World Conference on Photovoltaic Energy Conversion - Kyoto, Japan Duration: 23 Nov 2014 → 27 Nov 2014 |
Conference
Conference | WCPEC-6: 6th World Conference on Photovoltaic Energy Conversion |
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City | Kyoto, Japan |
Period | 23/11/14 → 27/11/14 |
NREL Publication Number
- NREL/CP-5J00-63259
Keywords
- boron
- N+ doped polysilicon
- n-type oxides
- passivated contacts
- silicon solar cells
- tunneling oxide