Abstract
In rf sputtering the film microstructure can be affected by many factors including substrate temperature, sputter gas pressure, substrate bias, and the magnetic field of the magnetron. In this paper we examine principally the effects of pressure, substrate bias, and the magnetic field of the planar magnetron sputter source on the microstructure and relate this to the performance of CdS/CdTe solarcells in which both semiconductor layers were grown by rf sputtering. With careful choice of gas pressure and magnetic field configuration, we have demonstrated an all-rf-sputtered CdS/CdTe solar cell with AM1.5 efficiency of 11.6% as confirmed by NREL.
Original language | American English |
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Pages | 869-872 |
Number of pages | 4 |
DOIs | |
State | Published - 1996 |
Event | Twenty Fifth IEEE Photovoltaic Specialists Conference - Washington, D.C. Duration: 13 May 1996 → 17 May 1996 |
Conference
Conference | Twenty Fifth IEEE Photovoltaic Specialists Conference |
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City | Washington, D.C. |
Period | 13/05/96 → 17/05/96 |
Bibliographical note
Work performed by the University of Toledo, Toledo, OhioNREL Publication Number
- NREL/CP-22416