Abstract
An aspect of the present disclosure is a method of making a device, wherein the method includes, in order, depositing a layer of a photoresist onto a substrate, depositing a mask onto the photoresist, developing the photoresist, resulting in the forming of a grid having a plurality of cavities, and depositing a semiconductor onto the grid, resulting in substantially filling each cavity with the semiconductor.
| Original language | American English |
|---|---|
| Patent number | 12,405,391 B2 |
| Filing date | 2/09/25 |
| State | Published - 2025 |
NREL Publication Number
- NREL/PT-5K00-96945
Keywords
- photoresist
- plurality of cavities
- semiconductor
- substrate