Phosphorus and Boron Doping Effects on Nanocrystalline Formation in Hydrogenated Amorphous and Nanocrystalline Mixed-Phase Silicon Thin Films: Paper No. 1153-A17-07

Chun Sheng Jiang

Phosphorus and Boron Doping Effects on Nanocrystalline Formation in Hydrogenated Amorphous and Nanocrystalline Mixed-Phase Silicon Thin Films: Paper No. 1153-A17-07

Materials Science

Research output: Contribution to conference › Paper

Original language	American English
Pages	345-350
Number of pages	6
State	Published - 2009
Event	Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2009: Materials Research Society Symposium - San Francisco, California Duration: 14 Apr 2009 → 17 Apr 2009

Conference

Conference	Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2009: Materials Research Society Symposium
City	San Francisco, California
Period	14/04/09 → 17/04/09

NREL Publication Number

NREL/CP-520-45598

Keywords

B
nucleation and growth
Si

Cite this

@conference{dd64b1a7d32f46d1ada59125dec8c79d,

title = "Phosphorus and Boron Doping Effects on Nanocrystalline Formation in Hydrogenated Amorphous and Nanocrystalline Mixed-Phase Silicon Thin Films: Paper No. 1153-A17-07",

keywords = "B, nucleation and growth, Si",

author = "Jiang, {Chun Sheng}",

year = "2009",

language = "American English",

pages = "345--350",

note = "Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2009: Materials Research Society Symposium ; Conference date: 14-04-2009 Through 17-04-2009",

}

Jiang, CS 2009, 'Phosphorus and Boron Doping Effects on Nanocrystalline Formation in Hydrogenated Amorphous and Nanocrystalline Mixed-Phase Silicon Thin Films: Paper No. 1153-A17-07', Paper presented at Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2009: Materials Research Society Symposium, San Francisco, California, 14/04/09 - 17/04/09 pp. 345-350.

Phosphorus and Boron Doping Effects on Nanocrystalline Formation in Hydrogenated Amorphous and Nanocrystalline Mixed-Phase Silicon Thin Films: Paper No. 1153-A17-07. / Jiang, Chun Sheng.
2009. 345-350 Paper presented at Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2009: Materials Research Society Symposium, San Francisco, California.

Research output: Contribution to conference › Paper

TY - CONF

T1 - Phosphorus and Boron Doping Effects on Nanocrystalline Formation in Hydrogenated Amorphous and Nanocrystalline Mixed-Phase Silicon Thin Films

T2 - Amorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2009: Materials Research Society Symposium

AU - Jiang, Chun Sheng

PY - 2009

Y1 - 2009

KW - B

KW - nucleation and growth

KW - Si

M3 - Paper

SP - 345

EP - 350

Y2 - 14 April 2009 through 17 April 2009

ER -