Photobleaching of PL and Temperature Dependence of ESR in Nitrogen-Rich Amorphous Silicon Nitride Films

Photobleaching of PL and Temperature Dependence of ESR in Nitrogen-Rich Amorphous Silicon Nitride Films

Research output: Contribution to conference › Paper

Original language	American English
Pages	619-624
Number of pages	6
State	Published - 1994
Event	Amorphous Silicon Technology 1994: Materials Research Society Symposium - San Francisco, California Duration: 4 Apr 1994 → 8 Apr 1994

Conference

Conference	Amorphous Silicon Technology 1994: Materials Research Society Symposium
City	San Francisco, California
Period	4/04/94 → 8/04/94

Bibliographical note

Work performed by the Department of Physics, University of Utah, Salt Lake City, Utah and the IBM T.J. Watson Research Center, Yorktown Heights, New York

NREL Publication Number

ACNR/CP-16067

Cite this

@conference{90ffd769a6074579aa611ed7bd9b6432,

title = "Photobleaching of PL and Temperature Dependence of ESR in Nitrogen-Rich Amorphous Silicon Nitride Films",

author = "NREL",

note = "Work performed by the Department of Physics, University of Utah, Salt Lake City, Utah and the IBM T.J. Watson Research Center, Yorktown Heights, New York; Amorphous Silicon Technology 1994: Materials Research Society Symposium ; Conference date: 04-04-1994 Through 08-04-1994",

year = "1994",

language = "American English",

pages = "619--624",

}

TY - CONF

T1 - Photobleaching of PL and Temperature Dependence of ESR in Nitrogen-Rich Amorphous Silicon Nitride Films

AU - NREL, null

N1 - Work performed by the Department of Physics, University of Utah, Salt Lake City, Utah and the IBM T.J. Watson Research Center, Yorktown Heights, New York

PY - 1994

Y1 - 1994

M3 - Paper

SP - 619

EP - 624

T2 - Amorphous Silicon Technology 1994: Materials Research Society Symposium

Y2 - 4 April 1994 through 8 April 1994

ER -