Photoelectronic Properties of a-Si:H and a-Ge:H Thin Films in Surface Cell Structures

    Research output: Contribution to journalArticle

    Original languageAmerican English
    Pages (from-to)1655-1660
    Number of pages6
    JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
    Issue number4, Part III
    StatePublished - 1987

    Bibliographical note

    Work performed by Department of Physics, North Carolina State University, Raleigh, North Carolina and Hitachi Central Research Laboratory, Tokyo, Japan

    NREL Publication Number

    • ACNR/JA-10689

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