@article{ded68acad8ff4b2b92393125659fae46,
title = "Photoelectronic Properties of a-Si:H and a-Ge:H Thin Films in Surface Cell Structures",
author = "NREL",
note = "Work performed by Department of Physics, North Carolina State University, Raleigh, North Carolina and Hitachi Central Research Laboratory, Tokyo, Japan",
year = "1987",
doi = "10.1116/1.574541",
language = "American English",
volume = "5",
pages = "1655--1660",
journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",
issn = "0734-2101",
publisher = "AVS Science and Technology Society",
number = "4, Part III",
}