Physics and Chemistry of Hot-Wire Chemical Vapor Deposition from Silane: Measuring and Modeling the Silicon Epitaxy Deposition Rate: Article No. 054906

  • Ina Martin
  • , Charles Teplin
  • , James Doyle

    Research output: Contribution to journalArticlepeer-review

    Fingerprint

    Dive into the research topics of 'Physics and Chemistry of Hot-Wire Chemical Vapor Deposition from Silane: Measuring and Modeling the Silicon Epitaxy Deposition Rate: Article No. 054906'. Together they form a unique fingerprint.

    Chemical Engineering

    Material Science

    Engineering