Planar Magnetron Sputtering of a-Si:H and a-Ge:H Thin Films

Research output: Contribution to journal › Article

Original language	American English
Pages (from-to)	326-329
Number of pages	4
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	2
Issue number	2, Part I
DOIs	https://doi.org/10.1116/1.572593
State	Published - 1984

Work performed by Department of Physics, North Carolina State University, Raleigh, North Carolina

NREL Publication Number

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title = "Planar Magnetron Sputtering of a-Si:H and a-Ge:H Thin Films",

author = "NREL",

note = "Work performed by Department of Physics, North Carolina State University, Raleigh, North Carolina",

year = "1984",

doi = "10.1116/1.572593",

language = "American English",

volume = "2",

pages = "326--329",

journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "2, Part I",

}

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T1 - Planar Magnetron Sputtering of a-Si:H and a-Ge:H Thin Films

AU - NREL, null

N1 - Work performed by Department of Physics, North Carolina State University, Raleigh, North Carolina

PY - 1984

Y1 - 1984

U2 - 10.1116/1.572593

DO - 10.1116/1.572593

M3 - Article

SN - 0734-2101

VL - 2

SP - 326

EP - 329

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 2, Part I

ER -