| Original language | American English |
|---|---|
| Patent number | 6,458,254 B2 |
| State | Published - 2002 |
NLR Publication Number
- NREL/PT-520-33002
Plasma and Reactive Ion Etching to Prepare Ohmic Contacts
- Timothy Gessert (Inventor)
Research output: Patent
Research output: Patent
| Original language | American English |
|---|---|
| Patent number | 6,458,254 B2 |
| State | Published - 2002 |