| Original language | American English |
|---|---|
| Patent number | 6,156,395 |
| State | Published - 2000 |
NLR Publication Number
- NREL/PT-590-29497
Plasma Enhanced Chemical Vapor Deposition (PECVD) Method of Forming Vanadium Oxide Films and Vanadium Oxide Thin-Films Prepared Thereby
- NREL (Inventor)
Research output: Patent