Poly-Si Thin Film Formation Using a Novel Low Thermal Budget Process: Paper No. 1321-A03-05

Research output: Contribution to conference › Paper

Original language	American English
Pages	167-172
Number of pages	6
DOIs	https://doi.org/10.1557/opl.2011.804
State	Published - 2011
Event	2011 Materials Research Society Symposium - San Francisco, California Duration: 25 Apr 2011 → 29 Apr 2011

Conference	2011 Materials Research Society Symposium
City	San Francisco, California
Period	25/04/11 → 29/04/11

NLR Publication Number

@conference{03d7e3017ee84d50888b205efb11e11d,

title = "Poly-Si Thin Film Formation Using a Novel Low Thermal Budget Process: Paper No. 1321-A03-05",

keywords = "material properties, poly-Si film, thin films",

author = "Qi Wang and Minghao Zhu and Chen-Han Lin and Yue Kuo",

year = "2011",

doi = "10.1557/opl.2011.804",

language = "American English",

pages = "167--172",

note = "2011 Materials Research Society Symposium ; Conference date: 25-04-2011 Through 29-04-2011",

}

TY - CONF

T1 - Poly-Si Thin Film Formation Using a Novel Low Thermal Budget Process

T2 - 2011 Materials Research Society Symposium

AU - Wang, Qi

AU - Zhu, Minghao

AU - Lin, Chen-Han

AU - Kuo, Yue

PY - 2011

Y1 - 2011

KW - material properties

KW - poly-Si film

KW - thin films

U2 - 10.1557/opl.2011.804

DO - 10.1557/opl.2011.804

M3 - Paper

SP - 167

EP - 172

Y2 - 25 April 2011 through 29 April 2011

ER -