Preparation and Properties of High Quality Crystalline Silicon Films Grown by ECR Plasma Deposition

Preparation and Properties of High Quality Crystalline Silicon Films Grown by ECR Plasma Deposition

Research output: Contribution to conference › Paper

Original language	American English
Pages	Vol. II: 1258-1261
Number of pages	4
State	Published - 1994
Event	1994 IEEE First World Conference on Photovoltaic Energy Conversion: Twenty-Fourth IEEE Photovoltaic Specialists Conference - Waikoloa, Hawaii Duration: 5 Dec 1994 → 9 Dec 1994

Conference

Conference	1994 IEEE First World Conference on Photovoltaic Energy Conversion: Twenty-Fourth IEEE Photovoltaic Specialists Conference
City	Waikoloa, Hawaii
Period	5/12/94 → 9/12/94

Bibliographical note

Work performed by Iowa State University, Ames, Iowa

NREL Publication Number

NREL/CP-20144

Cite this

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title = "Preparation and Properties of High Quality Crystalline Silicon Films Grown by ECR Plasma Deposition",

author = "NREL",

note = "Work performed by Iowa State University, Ames, Iowa; 1994 IEEE First World Conference on Photovoltaic Energy Conversion: Twenty-Fourth IEEE Photovoltaic Specialists Conference ; Conference date: 05-12-1994 Through 09-12-1994",

year = "1994",

language = "American English",

pages = "Vol. II: 1258--1261",

}

TY - CONF

T1 - Preparation and Properties of High Quality Crystalline Silicon Films Grown by ECR Plasma Deposition

AU - NREL, null

N1 - Work performed by Iowa State University, Ames, Iowa

PY - 1994

Y1 - 1994

M3 - Paper

SP - Vol. II: 1258-1261

T2 - 1994 IEEE First World Conference on Photovoltaic Energy Conversion: Twenty-Fourth IEEE Photovoltaic Specialists Conference

Y2 - 5 December 1994 through 9 December 1994

ER -