Process Analysis and Modeling of Thin Silicon Film Deposition by Hot-Wire Chemical Vapor Deposition

Process Analysis and Modeling of Thin Silicon Film Deposition by Hot-Wire Chemical Vapor Deposition

Research output: Contribution to conference › Paper

Original language	American English
Pages	Vol. I: 621-624
Number of pages	4
State	Published - 2000
Event	Sixteenth European Photovoltaic Solar Energy Conference: International Conference - Glasgow, United Kingdom Duration: 1 May 2000 → 5 May 2000

Conference

Conference	Sixteenth European Photovoltaic Solar Energy Conference: International Conference
City	Glasgow, United Kingdom
Period	1/05/00 → 5/05/00

Bibliographical note

Work performed by University of Delaware and AstroPower, Inc., Newark, Delaware

NREL Publication Number

NREL/CP-520-31891

Cite this

@conference{2435169f142444528308d2bbc442f4de,

title = "Process Analysis and Modeling of Thin Silicon Film Deposition by Hot-Wire Chemical Vapor Deposition",

author = "NREL",

note = "Work performed by University of Delaware and AstroPower, Inc., Newark, Delaware; Sixteenth European Photovoltaic Solar Energy Conference: International Conference ; Conference date: 01-05-2000 Through 05-05-2000",

year = "2000",

language = "American English",

pages = "Vol. I: 621--624",

}

TY - CONF

T1 - Process Analysis and Modeling of Thin Silicon Film Deposition by Hot-Wire Chemical Vapor Deposition

AU - NREL, null

N1 - Work performed by University of Delaware and AstroPower, Inc., Newark, Delaware

PY - 2000

Y1 - 2000

M3 - Paper

SP - Vol. I: 621-624

T2 - Sixteenth European Photovoltaic Solar Energy Conference: International Conference

Y2 - 1 May 2000 through 5 May 2000

ER -