Production Technology for Passivation of Polycrystalline Silicon Solar Cells

    Research output: Contribution to conferencePaper

    Abstract

    Techniques for cost-efficient operation of SiNx:H systems with a capability for hydrogen passivation in a manufacturing environment are analyzed. We conclude that SiNx:H performance may be optimized by a variety of techniques, and that the cost and productivity of the deposition tool may be the determining factors in the industry's decision for a particular technique. PECVD constitutes thecurrent benchmark. Dual magnetron reactive sputtering is a candidate to achieve industry acceptance.
    Original languageAmerican English
    Pages300-307
    Number of pages8
    StatePublished - 2002
    Event12th Workshop on Crystalline Silicon Solar Cell Materials and Processes - Breckenridge, Colorado
    Duration: 11 Aug 200214 Aug 2002

    Conference

    Conference12th Workshop on Crystalline Silicon Solar Cell Materials and Processes
    CityBreckenridge, Colorado
    Period11/08/0214/08/02

    NREL Publication Number

    • NREL/CP-520-32716

    Keywords

    • 12th workshop
    • crystalline silicon (x-Si) (c-Si)
    • PV
    • solar cell materials

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