Properties of Amorphous Silicon Films and Devices Deposited Using Reactive Plasma Beam Deposition

Properties of Amorphous Silicon Films and Devices Deposited Using Reactive Plasma Beam Deposition

Research output: Contribution to conference › Paper

Original language	American English
Pages	388-394
Number of pages	7
State	Published - 1992
Event	Photovoltaic Advanced Research and Development Project: 11th Review Meeting - Denver, Colorado Duration: 13 May 1992 → 15 May 1992

Conference

Conference	Photovoltaic Advanced Research and Development Project: 11th Review Meeting
City	Denver, Colorado
Period	13/05/92 → 15/05/92

Bibliographical note

Work performed by Iowa State University, Ames, Iowa

NREL Publication Number

ACNR/CP-14758

Cite this

@conference{3171a587889e43ebb9f9399731ec69e3,

title = "Properties of Amorphous Silicon Films and Devices Deposited Using Reactive Plasma Beam Deposition",

author = "NREL",

note = "Work performed by Iowa State University, Ames, Iowa; Photovoltaic Advanced Research and Development Project: 11th Review Meeting ; Conference date: 13-05-1992 Through 15-05-1992",

year = "1992",

language = "American English",

pages = "388--394",

}