Properties of Amorphous Silicon-Germanium Films and Devices Deposited at Higher Growth Rates

Properties of Amorphous Silicon-Germanium Films and Devices Deposited at Higher Growth Rates

Research output: Contribution to conference › Paper

Original language	American English
Pages	515-520
Number of pages	6
State	Published - 2002
Event	Amorphous and Heterogeneous Silicon-Based Films 2002: Materials Research Society Symposium - San Francisco, California Duration: 2 Apr 2002 → 5 Apr 2002

Conference

Conference	Amorphous and Heterogeneous Silicon-Based Films 2002: Materials Research Society Symposium
City	San Francisco, California
Period	2/04/02 → 5/04/02

Bibliographical note

Work performed by Iowa State University, Ames, Iowa

NREL Publication Number

NREL/CP-520-34505

Cite this

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title = "Properties of Amorphous Silicon-Germanium Films and Devices Deposited at Higher Growth Rates",

author = "NREL",

note = "Work performed by Iowa State University, Ames, Iowa; Amorphous and Heterogeneous Silicon-Based Films 2002: Materials Research Society Symposium ; Conference date: 02-04-2002 Through 05-04-2002",

year = "2002",

language = "American English",

pages = "515--520",

}

TY - CONF

T1 - Properties of Amorphous Silicon-Germanium Films and Devices Deposited at Higher Growth Rates

AU - NREL, null

N1 - Work performed by Iowa State University, Ames, Iowa

PY - 2002

Y1 - 2002

M3 - Paper

SP - 515

EP - 520

T2 - Amorphous and Heterogeneous Silicon-Based Films 2002: Materials Research Society Symposium

Y2 - 2 April 2002 through 5 April 2002

ER -