Properties of Hydrogenated Amorphous Silicon Prepared by Chemical Vapor Deposition

    Research output: Contribution to journalArticle

    Original languageAmerican English
    Pages (from-to)4309-4317
    Number of pages9
    JournalJournal of Applied Physics
    Issue number12
    StatePublished - 1984

    Bibliographical note

    Work performed by Department of Chemistry and Division of Applied Sciences, Harvard University, Cambridge, Massachusetts

    NREL Publication Number

    • ACNR/JA-213-3600

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