Properties of Thin Film Silicon Nitride Deposited by Hot Wire Chemical Vapor Deposition Using Silane, Ammonia, and Hydrogen Gas Mixtures

Research output: Contribution to journal › Article › peer-review

NLR Publication Number

@article{0091feebd7be4d5499f208cc339eaee0,

title = "Properties of Thin Film Silicon Nitride Deposited by Hot Wire Chemical Vapor Deposition Using Silane, Ammonia, and Hydrogen Gas Mixtures",

author = "NREL",

year = "2003",

doi = "10.1063/1.1590053",

language = "American English",

volume = "94",

pages = "2360--2367",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "4",

}