PVMaT Improvements in Monolithic a-Si Modules on Continuous Polymer Substrates

PVMaT Improvements in Monolithic a-Si Modules on Continuous Polymer Substrates

Research output: Contribution to conference › Paper

Abstract

Iowa Thin Film Technologies, in conjunction with NREL, is engaged in a 3 year cost shared PVMaT program with goals to improve overall module performance, increase manufacturing throughput and to reduce the overall module manufacturing costs of the ITF production line by 68%. The first year of the contract has seen significant progess toward those goals with process improvements yielding a 30%manufacturing cost reduction. These reductions come from improvements in the alignment processes in the patterning steps, development of a roll based lamination process, and improved area utilization.

Original language	American English
Pages	451-461
Number of pages	11
State	Published - 1997
Event	NREL/SNL Photovoltaics Program Review: 14th Conference - Lakewood, Colorado Duration: 18 Nov 1996 → 22 Nov 1996

Conference

Conference	NREL/SNL Photovoltaics Program Review: 14th Conference
City	Lakewood, Colorado
Period	18/11/96 → 22/11/96

Bibliographical note

Work performed by Iowa Thin Film Technologies, Inc., Ames, Iowa and Iowa State University, Ames, Iowa

NREL Publication Number

NREL/CP-23699

Cite this

@conference{3a6f1fda3d324e24b3c8042611f0ae02,

title = "PVMaT Improvements in Monolithic a-Si Modules on Continuous Polymer Substrates",

abstract = "Iowa Thin Film Technologies, in conjunction with NREL, is engaged in a 3 year cost shared PVMaT program with goals to improve overall module performance, increase manufacturing throughput and to reduce the overall module manufacturing costs of the ITF production line by 68%. The first year of the contract has seen significant progess toward those goals with process improvements yielding a 30%manufacturing cost reduction. These reductions come from improvements in the alignment processes in the patterning steps, development of a roll based lamination process, and improved area utilization.",

author = "NREL",

note = "Work performed by Iowa Thin Film Technologies, Inc., Ames, Iowa and Iowa State University, Ames, Iowa; NREL/SNL Photovoltaics Program Review: 14th Conference ; Conference date: 18-11-1996 Through 22-11-1996",

year = "1997",

language = "American English",

pages = "451--461",

}

TY - CONF

T1 - PVMaT Improvements in Monolithic a-Si Modules on Continuous Polymer Substrates

AU - NREL, null

N1 - Work performed by Iowa Thin Film Technologies, Inc., Ames, Iowa and Iowa State University, Ames, Iowa

PY - 1997

Y1 - 1997

N2 - Iowa Thin Film Technologies, in conjunction with NREL, is engaged in a 3 year cost shared PVMaT program with goals to improve overall module performance, increase manufacturing throughput and to reduce the overall module manufacturing costs of the ITF production line by 68%. The first year of the contract has seen significant progess toward those goals with process improvements yielding a 30%manufacturing cost reduction. These reductions come from improvements in the alignment processes in the patterning steps, development of a roll based lamination process, and improved area utilization.

AB - Iowa Thin Film Technologies, in conjunction with NREL, is engaged in a 3 year cost shared PVMaT program with goals to improve overall module performance, increase manufacturing throughput and to reduce the overall module manufacturing costs of the ITF production line by 68%. The first year of the contract has seen significant progess toward those goals with process improvements yielding a 30%manufacturing cost reduction. These reductions come from improvements in the alignment processes in the patterning steps, development of a roll based lamination process, and improved area utilization.

M3 - Paper

SP - 451

EP - 461

T2 - NREL/SNL Photovoltaics Program Review: 14th Conference

Y2 - 18 November 1996 through 22 November 1996

ER -

PVMaT Improvements in Monolithic a-Si Modules on Continuous Polymer Substrates

Abstract

Conference

Bibliographical note

NREL Publication Number

Fingerprint

Cite this