Rapid Mapping of AR Coating Thickness on Si Solar Cells Using GT-FabScan 6000

Research output: Contribution to conferencePaper

Abstract

A new technique for rapid mapping of the thickness of an antireflection (AR) coating on a solar cell is described. A filtered, reflectance (intensity) image of the AR-coated wafer is generated by a CCD camera mounted on a GTFabScan. This image is converted into a thickness image using a transformation relating local AR thickness to the local intensity in the image plane. The thickness map isgenerated in <100 ms.
Original languageAmerican English
Number of pages7
StatePublished - 2005
Event31st IEEE Photovoltaics Specialists Conference and Exhibition - Lake Buena Vista, Florida
Duration: 3 Jan 20057 Jan 2005

Conference

Conference31st IEEE Photovoltaics Specialists Conference and Exhibition
CityLake Buena Vista, Florida
Period3/01/057/01/05

NREL Publication Number

  • NREL/CP-520-37478

Keywords

  • antireflection coatings
  • photocurrent
  • PV
  • reflectance (intensity) image
  • solar cells
  • thickness

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