Rapid Thermal Annealing of Hot Wire Chemical-Vapor-Deposited a-Si:H Films: The Effect of the Film Hydrogen Content on the Crystallization Kinetics, Surface Morphology, and Grain Growth: Article No. 023507

Robert Reedy Jr.

Research output: Contribution to journalArticlepeer-review

Original languageAmerican English
Number of pages9
JournalJournal of Applied Physics
Volume99
Issue number2
DOIs
StatePublished - 2006

NREL Publication Number

  • NREL/JA-520-39647

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