Rapid Thermal Annealing of HWCVD a-Si:H Films: The Effect of the Film Hydrogen Content on the Crystallization Kinetics, Surface Morphology, and Grain Growth

Research output: Contribution to conferencePaper

Abstract

We report the effect of the hydrogen (H) content (CH) on the crystallization kinetics, surface morphology and grain growth for Hot Wire CVD a-Si:H films containing 12.5 and 2.7 at.% H which are crystallized by rapid thermal anneal (RTA). For the high CH film we observe explosive H evolution, with a resultant destruction of the film for RTA temperatures >750 deg C. At RTA temperatures~600 deg C,both films remain intact with similar morphologies. At this same lower RTA, the incubation and crystallization times decrease, and the grain size as measured by X-Ray Diffraction increases with decreasing film CH. SIMS measurements indicate that a similar film CH (<0.5 at.%) exists in both films when crystallization commences. The benefits of a two-step annealing process for the high CH film aredocumented.
Original languageAmerican English
Number of pages5
StatePublished - 2005
Event2005 DOE Solar Energy Technologies Program Review Meeting - Denver, Colorado
Duration: 7 Nov 200510 Nov 2005

Conference

Conference2005 DOE Solar Energy Technologies Program Review Meeting
CityDenver, Colorado
Period7/11/0510/11/05

Bibliographical note

Presented at the 2005 DOE Solar Energy Technologies Program Review Meeting held November 7-10, 2005 in Denver, Colorado. Also included in the proceedings available on CD-ROM (DOE/GO-102006-2245; NREL/CD-520-38557)

NREL Publication Number

  • NREL/CP-520-38953

Keywords

  • CdTe
  • NREL
  • photovoltaics (PV)
  • PV
  • solar

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