Rapid Thermal Processing Chamber for In-Situ X-Ray Diffraction

Jeremy Fields, Philip Parilla, David Ginley, Marinus Van Hest, Md. Ahmad, Douglas Van Campen, Jiafan Yu, Vanessa Pool, Michael Toney

Research output: Contribution to journalArticlepeer-review

15 Scopus Citations


Rapid thermal processing (RTP) is widely used for processing a variety of materials, including electronics and photovoltaics. Presently, optimization of RTP is done primarily based on ex-situ studies. As a consequence, the precise reaction pathways and phase progression during the RTP remain unclear. More awareness of the reaction pathways would better enable process optimization and foster increased adoption of RTP, which offers numerous advantages for synthesis of a broad range of materials systems. To achieve this, we have designed and developed a RTP instrument that enables real-time collection of X-ray diffraction data with intervals as short as 100 ms, while heating with ramp rates up to 100 °Cs-1, and with a maximum operating temperature of 1200 °C. The system is portable and can be installed on a synchrotron beamline. The unique capabilities of this instrument are demonstrated with in-situ characterization of a Bi2O3-SiO2 glass frit obtained during heating with ramp rates 5 °C s-1 and 100 °C s-1, revealing numerous phase changes.

Original languageAmerican English
Article numberArticle No. 013902
Number of pages7
JournalReview of Scientific Instruments
Issue number1
StatePublished - 1 Jan 2015

Bibliographical note

Publisher Copyright:
© 2015 AIP Publishing LLC.

NREL Publication Number

  • NREL/JA-5K00-63814


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