Reactive Sputtered Copper Indium Diselenide Films for Photovoltaic Applications

Research output: Contribution to journal › Article

Original language	American English
Pages (from-to)	307-311
Number of pages	5
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	2
Issue number	2, Part I
DOIs	https://doi.org/10.1116/1.572589
State	Published - 1984

Work performed by Telic Co., Santa Monica, California, and Institute for Energy Conversion, University of Delaware, Newark, Delaware

NREL Publication Number

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title = "Reactive Sputtered Copper Indium Diselenide Films for Photovoltaic Applications",

author = "NREL",

note = "Work performed by Telic Co., Santa Monica, California, and Institute for Energy Conversion, University of Delaware, Newark, Delaware",

year = "1984",

doi = "10.1116/1.572589",

language = "American English",

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journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "2, Part I",

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TY - JOUR

T1 - Reactive Sputtered Copper Indium Diselenide Films for Photovoltaic Applications

AU - NREL, null

N1 - Work performed by Telic Co., Santa Monica, California, and Institute for Energy Conversion, University of Delaware, Newark, Delaware

PY - 1984

Y1 - 1984

U2 - 10.1116/1.572589

DO - 10.1116/1.572589

M3 - Article

SN - 0734-2101

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EP - 311

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 2, Part I

ER -