Real-Time Characterization of Hot-Wire CVD Growth of Si:H Films using Spectroscopic Ellipsometry: Preprint

Real-Time Characterization of Hot-Wire CVD Growth of Si:H Films using Spectroscopic Ellipsometry: Preprint

Research output: Contribution to conference › Paper

Abstract

Presented at the 2001 NCPV Program Review Meeting: First application of real-time spectroscopic ellipsometry to in situ characterization of hot-wire CVD of hydrogenated-silicon thin films.

Original language	American English
Number of pages	4
State	Published - 2001
Event	NCPV Program Review Meeting - Lakewood, Colorado Duration: 14 Oct 2001 → 17 Oct 2001

Conference

Conference	NCPV Program Review Meeting
City	Lakewood, Colorado
Period	14/10/01 → 17/10/01

NREL Publication Number

NREL/CP-520-31051

Keywords

hot-wire CVD
hydrogenated amorphous silicon (a-Si:H)
NCPV
photovoltaics (PV)
thin films

Access to Document

https://www.nrel.gov/docs/fy02osti/31051.pdf

Cite this

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title = "Real-Time Characterization of Hot-Wire CVD Growth of Si:H Films using Spectroscopic Ellipsometry: Preprint",

abstract = "Presented at the 2001 NCPV Program Review Meeting: First application of real-time spectroscopic ellipsometry to in situ characterization of hot-wire CVD of hydrogenated-silicon thin films.",

keywords = "hot-wire CVD, hydrogenated amorphous silicon (a-Si:H), NCPV, photovoltaics (PV), thin films",

author = "NREL",

year = "2001",

language = "American English",

note = "NCPV Program Review Meeting ; Conference date: 14-10-2001 Through 17-10-2001",

}

TY - CONF

T1 - Real-Time Characterization of Hot-Wire CVD Growth of Si:H Films using Spectroscopic Ellipsometry: Preprint

AU - NREL, null

PY - 2001

Y1 - 2001

N2 - Presented at the 2001 NCPV Program Review Meeting: First application of real-time spectroscopic ellipsometry to in situ characterization of hot-wire CVD of hydrogenated-silicon thin films.

AB - Presented at the 2001 NCPV Program Review Meeting: First application of real-time spectroscopic ellipsometry to in situ characterization of hot-wire CVD of hydrogenated-silicon thin films.

KW - hot-wire CVD

KW - hydrogenated amorphous silicon (a-Si:H)

KW - NCPV

KW - photovoltaics (PV)

KW - thin films

M3 - Paper

T2 - NCPV Program Review Meeting

Y2 - 14 October 2001 through 17 October 2001

ER -

Real-Time Characterization of Hot-Wire CVD Growth of Si:H Films using Spectroscopic Ellipsometry: Preprint

Abstract

Conference

NREL Publication Number

Keywords

Access to Document

Fingerprint

Cite this