Abstract
This work shows that the hole lifetime of n-type Al0.10Ga0.90 As is controlled by impurity-oxygen-related recombination centers with capture cross sections of about 1012 cm2 when the films are grown at temperatures of 720°C and lower. Correlated time-resolved photoluminescence and deep level transient spectroscopy measurements link these centers to well known impurity oxygen complexes. Film growth at temperatures above about 720°C eliminates these oxygen complexes from the epitaxial layer resulting in greatly improved photovoltaic properties.
Original language | American English |
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Pages | 712-716 |
Number of pages | 5 |
State | Published - 1993 |
Event | Proceedings of the 23rd IEEE Photovoltaic Specialists Conference - Louisville, KY, USA Duration: 10 May 1993 → 14 May 1993 |
Conference
Conference | Proceedings of the 23rd IEEE Photovoltaic Specialists Conference |
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City | Louisville, KY, USA |
Period | 10/05/93 → 14/05/93 |
NREL Publication Number
- ACNR/CP-412-13601