Abstract
Mesoporous Ge was generated by bipolar electrochemical etching of (100) Ge. Through high-temperature annealing experiments, we found that the mesoporous Ge microstructure produces pore coalescence deep in the structure rather than at the surface. III-V epitaxy on annealed porous Ge with subsurface coalescence and coral-like structures on the surface produced shunted photovoltaic devices. The roughness of the annealed porous Ge film was reduced by a pre-annealing HBr treatment and a post-annealing ultrasonic DI water dip. A smoother reformed surface was obtained, on which a GaInAs upright device with an efficiency of 5.7% was grown, demonstrating a first step towards technical viability.
| Original language | American English |
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| Pages | 979-982 |
| Number of pages | 4 |
| DOIs | |
| State | Published - Jun 2019 |
| Event | 46th IEEE Photovoltaic Specialists Conference, PVSC 2019 - Chicago, United States Duration: 16 Jun 2019 → 21 Jun 2019 |
Conference
| Conference | 46th IEEE Photovoltaic Specialists Conference, PVSC 2019 |
|---|---|
| Country/Territory | United States |
| City | Chicago |
| Period | 16/06/19 → 21/06/19 |
Bibliographical note
Publisher Copyright:© 2019 IEEE.
NLR Publication Number
- NREL/CP-5900-73084
Keywords
- III-V solar cells
- photovoltaics
- porosification
- substrate reuse