Role of Mechanical Stress in Light-Induced Degradation of Hydrogenated Amorphous Silicon

Research output: Contribution to journal › Article

Work performed by Xerox Palo Alto Research Center, Palo Alto, California

NREL Publication Number

@article{d0f73fd0545444688fac8bf0bdae9ccf,

title = "Role of Mechanical Stress in Light-Induced Degradation of Hydrogenated Amorphous Silicon",

author = "NREL",

note = "Work performed by Xerox Palo Alto Research Center, Palo Alto, California",

year = "1985",

doi = "10.1063/1.96415",

language = "American English",

volume = "47",

pages = "21--23",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "1",

}

TY - JOUR

T1 - Role of Mechanical Stress in Light-Induced Degradation of Hydrogenated Amorphous Silicon

AU - NREL, null

N1 - Work performed by Xerox Palo Alto Research Center, Palo Alto, California

PY - 1985

Y1 - 1985

U2 - 10.1063/1.96415

DO - 10.1063/1.96415

M3 - Article

SN - 0003-6951

VL - 47

SP - 21

EP - 23

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 1

ER -