Self-Assembled Monolayer Patterning for PolySi/SiO2 Passivated Contacts

Bill Nemeth; David Young; Matthew Page; Vincenzo LaSalvia; San Theingi; Pauls Stradins

doi:10.1109/PVSC48320.2023.10359621

Self-Assembled Monolayer Patterning for PolySi/SiO2 Passivated Contacts

Bill Nemeth, David Young, Matthew Page, Vincenzo LaSalvia, San Theingi, Pauls Stradins

Chemistry and Nanoscience

Research output: Contribution to conference › Paper

Abstract

We utilize hexamethyldisilazane (HMDS) based self assembled monolayers to pattern polysilicon (polySi) passivated contacts. We find process conditions that allow for etching front side n/polySi between fingers; thereby increasing Jsc. Importantly, the Voc does not degrade indicating the additional process steps do not introduce defects or impurities. HMDS layers remain on the surface for metallization without detriment to transport.

Original language	American English
Number of pages	3
DOIs	https://doi.org/10.1109/PVSC48320.2023.10359621
State	Published - 2023
Event	2023 IEEE 50th Photovoltaic Specialists Conference (PVSC) - San Juan, Puerto Rico Duration: 11 Jun 2023 → 16 Jun 2023

Conference

Conference	2023 IEEE 50th Photovoltaic Specialists Conference (PVSC)
City	San Juan, Puerto Rico
Period	11/06/23 → 16/06/23

NREL Publication Number

NREL/CP-5900-88884

Keywords

degradation
fingers
impurities
metallization
photovoltaic cells
photovoltaic systems
resists

Access to Document

10.1109/PVSC48320.2023.10359621

Cite this

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title = "Self-Assembled Monolayer Patterning for PolySi/SiO2 Passivated Contacts",

abstract = "We utilize hexamethyldisilazane (HMDS) based self assembled monolayers to pattern polysilicon (polySi) passivated contacts. We find process conditions that allow for etching front side n/polySi between fingers; thereby increasing Jsc. Importantly, the Voc does not degrade indicating the additional process steps do not introduce defects or impurities. HMDS layers remain on the surface for metallization without detriment to transport.",

keywords = "degradation, fingers, impurities, metallization, photovoltaic cells, photovoltaic systems, resists",

author = "Bill Nemeth and David Young and Matthew Page and Vincenzo LaSalvia and San Theingi and Pauls Stradins",

year = "2023",

doi = "10.1109/PVSC48320.2023.10359621",

language = "American English",

note = "2023 IEEE 50th Photovoltaic Specialists Conference (PVSC) ; Conference date: 11-06-2023 Through 16-06-2023",

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TY - CONF

T1 - Self-Assembled Monolayer Patterning for PolySi/SiO2 Passivated Contacts

AU - Nemeth, Bill

AU - Young, David

AU - Page, Matthew

AU - LaSalvia, Vincenzo

AU - Theingi, San

AU - Stradins, Pauls

PY - 2023

Y1 - 2023

N2 - We utilize hexamethyldisilazane (HMDS) based self assembled monolayers to pattern polysilicon (polySi) passivated contacts. We find process conditions that allow for etching front side n/polySi between fingers; thereby increasing Jsc. Importantly, the Voc does not degrade indicating the additional process steps do not introduce defects or impurities. HMDS layers remain on the surface for metallization without detriment to transport.

AB - We utilize hexamethyldisilazane (HMDS) based self assembled monolayers to pattern polysilicon (polySi) passivated contacts. We find process conditions that allow for etching front side n/polySi between fingers; thereby increasing Jsc. Importantly, the Voc does not degrade indicating the additional process steps do not introduce defects or impurities. HMDS layers remain on the surface for metallization without detriment to transport.

KW - degradation

KW - fingers

KW - impurities

KW - metallization

KW - photovoltaic cells

KW - photovoltaic systems

KW - resists

U2 - 10.1109/PVSC48320.2023.10359621

DO - 10.1109/PVSC48320.2023.10359621

M3 - Paper

T2 - 2023 IEEE 50th Photovoltaic Specialists Conference (PVSC)

Y2 - 11 June 2023 through 16 June 2023

ER -

Self-Assembled Monolayer Patterning for PolySi/SiO2 Passivated Contacts

Abstract

Conference

NREL Publication Number

Keywords

Access to Document

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Cite this