Self-Assembled Monolayer Procedure to Pattern Silicon Passivated Contacts

Research output: NRELPoster


We utilize hexamethyldisilazane (HMDS)-based self-assembled monolayers to pattern polysilicon (polySi) passivated contacts. We find process conditions that allow for etching frontside n/polySi between fingers, thereby increasing Jsc. Importantly, the Voc does not degrade indicating the additional process steps do not introduce defects or impurities. HMDS layers remain on the surface for metallization without detriment to transport.
Original languageAmerican English
StatePublished - 2023

Publication series

NamePresented at the 50th IEEE Photovoltaic Specialists Conference, 11-16 June 2023, San Juan, Puerto Rico

NREL Publication Number

  • NREL/PO-5900-85798


  • hexamethyldisilazane
  • HMDS
  • monolayer
  • passivated contact
  • photovoltaic
  • poly-Si
  • polysilicon
  • PV
  • self-assembled


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