Self-Assembled Monolayers for Silicon Passivated Contacts

William Nemeth; Steve Harvey; David Young; Matt Page; Vincenzo La Salvia; San Theingi; Pauls Stradins

doi:10.1063/5.0089764

Self-Assembled Monolayers for Silicon Passivated Contacts

William Nemeth, Steve Harvey, David Young, Matt Page, Vincenzo La Salvia, San Theingi, Pauls Stradins

Research output: Contribution to conference › Paper › peer-review

1 Scopus Citations

Abstract

We present the application of self assembled monolayers (SAM) produced from hexamethyldisilazane (HMDS), to the polysilicon/tunneling SiCh interface as well as the external surface for application to silicon passivated contact solar cells. By immersing tunnel SiCh on cSi in the HMDS solution, almost complete trimethylsilyl coverage is achieved. This provides better adhesion for PECVD grown a-Si:H due to the presence of carbon, and subsequent high temperature crystallization does not lead to blistering, nor degrade surface or bulk passivation. This is demonstrated on passivated contact solar cells and symmetric structures. Furthermore, an HMDS functionalized surface is resistant to HF and TMAH etchants, but can be patterned with UV light, creating a selective mask template for subsequent wet etch.

Original language	American English
Number of pages	4
DOIs	https://doi.org/10.1063/5.0089764 https://doi.org/10.1063/5.0089764
State	Published - 24 Aug 2022
Event	11th International Conference on Crystalline Silicon Photovoltaics, SiliconPV 2021 - Hamelin, Virtual, Germany Duration: 19 Apr 2021 → 23 Apr 2021

Conference

Conference	11th International Conference on Crystalline Silicon Photovoltaics, SiliconPV 2021
Country/Territory	Germany
City	Hamelin, Virtual
Period	19/04/21 → 23/04/21

Bibliographical note

Publisher Copyright:
© 2022 American Institute of Physics Inc.. All rights reserved.

NREL Publication Number

NREL/CP-5900-80514

Keywords

hexamethyldisilazane
HMDS
passivated contact
photovoltaic
poly SiO2
PV

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title = "Self-Assembled Monolayers for Silicon Passivated Contacts",

abstract = "We present the application of self assembled monolayers (SAM) produced from hexamethyldisilazane (HMDS), to the polysilicon/tunneling SiCh interface as well as the external surface for application to silicon passivated contact solar cells. By immersing tunnel SiCh on cSi in the HMDS solution, almost complete trimethylsilyl coverage is achieved. This provides better adhesion for PECVD grown a-Si:H due to the presence of carbon, and subsequent high temperature crystallization does not lead to blistering, nor degrade surface or bulk passivation. This is demonstrated on passivated contact solar cells and symmetric structures. Furthermore, an HMDS functionalized surface is resistant to HF and TMAH etchants, but can be patterned with UV light, creating a selective mask template for subsequent wet etch.",

keywords = "hexamethyldisilazane, HMDS, passivated contact, photovoltaic, poly SiO2, PV",

author = "William Nemeth and Steve Harvey and David Young and Matt Page and {La Salvia}, Vincenzo and San Theingi and Pauls Stradins",

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T1 - Self-Assembled Monolayers for Silicon Passivated Contacts

AU - Nemeth, William

AU - Harvey, Steve

AU - Young, David

AU - Page, Matt

AU - La Salvia, Vincenzo

AU - Theingi, San

AU - Stradins, Pauls

PY - 2022/8/24

Y1 - 2022/8/24

N2 - We present the application of self assembled monolayers (SAM) produced from hexamethyldisilazane (HMDS), to the polysilicon/tunneling SiCh interface as well as the external surface for application to silicon passivated contact solar cells. By immersing tunnel SiCh on cSi in the HMDS solution, almost complete trimethylsilyl coverage is achieved. This provides better adhesion for PECVD grown a-Si:H due to the presence of carbon, and subsequent high temperature crystallization does not lead to blistering, nor degrade surface or bulk passivation. This is demonstrated on passivated contact solar cells and symmetric structures. Furthermore, an HMDS functionalized surface is resistant to HF and TMAH etchants, but can be patterned with UV light, creating a selective mask template for subsequent wet etch.

AB - We present the application of self assembled monolayers (SAM) produced from hexamethyldisilazane (HMDS), to the polysilicon/tunneling SiCh interface as well as the external surface for application to silicon passivated contact solar cells. By immersing tunnel SiCh on cSi in the HMDS solution, almost complete trimethylsilyl coverage is achieved. This provides better adhesion for PECVD grown a-Si:H due to the presence of carbon, and subsequent high temperature crystallization does not lead to blistering, nor degrade surface or bulk passivation. This is demonstrated on passivated contact solar cells and symmetric structures. Furthermore, an HMDS functionalized surface is resistant to HF and TMAH etchants, but can be patterned with UV light, creating a selective mask template for subsequent wet etch.

KW - hexamethyldisilazane

KW - HMDS

KW - passivated contact

KW - photovoltaic

KW - poly SiO2

KW - PV

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U2 - 10.1063/5.0089764

DO - 10.1063/5.0089764

M3 - Paper

AN - SCOPUS:85137488356

T2 - 11th International Conference on Crystalline Silicon Photovoltaics, SiliconPV 2021

Y2 - 19 April 2021 through 23 April 2021

ER -

Self-Assembled Monolayers for Silicon Passivated Contacts

Abstract

Conference

Bibliographical note

NREL Publication Number

Keywords

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