Simple Method for Preparing Hydrogenated Amorphous Silicon Films by Chemical Vapor Deposition at Atmospheric Pressure

    Research output: Contribution to journalArticle

    Original languageAmerican English
    Pages (from-to)5381-5384
    Number of pages4
    JournalJournal of Applied Physics
    Issue number9
    StatePublished - 1983

    Bibliographical note

    Work performed by Department of Chemistry, Harvard University, Cambridge, Massachusetts

    NREL Publication Number

    • ACNR/JA-5117

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