Small-Angle Neutron Scattering Studies of Hot-Wire CVD a-Si:H

D. L. Williamson, D. W.M. Marr, E. Iwaniczko, B. P. Nelson

Research output: Contribution to journalArticlepeer-review

3 Scopus Citations


Several a-Si:H and a-Si:D films prepared by hot-wire chemical vapor deposition have been examined by small-angle neutron scattering (SANS) to search for H non-uniformity in this material. The SANS measurements were supplemented by small-angle X-ray scattering measurements. The differences in H/D detection sensitivity of these two techniques allow distinction of the scattering mechanisms. Two- or three-phase models are used to interpret the results quantitatively. Significant H non-uniformity, as well as a small fraction of microvoids, was found in the best-quality material. Samples grown with higher deposition rates or lower substrate temperatures have much larger void fractions. The size scale of the heterogeneity spans a range from 2 nm to more than 50 nm, with the largest features assigned to surface roughness.

Original languageAmerican English
Pages (from-to)192-196
Number of pages5
JournalThin Solid Films
Issue number1-2
StatePublished - 2003
EventProceedings of the Second International Conference on CAT-CVD - Denver, CO, United States
Duration: 10 Sep 200213 Sep 2002

NREL Publication Number

  • NREL/JA-520-35029


  • Amorphous materials
  • Hot-wire deposition
  • Microstructure
  • Small-angle neutron scattering


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