Solid-Source Boron Doping of Float-Zoned Silicon

Solid-Source Boron Doping of Float-Zoned Silicon

Research output: Contribution to conference › Paper

Original language	American English
Number of pages	38
State	Published - 2003
Event	15th American Conference on Crystal Growth and Epitaxy and 11th Biennial Workshop on OMVPE and 3rd International Symposium on Lasers and Nonlinear Optical Materials - Keystone, Colorado Duration: 20 Jul 2003 → 24 Jul 2003

Conference

Conference	15th American Conference on Crystal Growth and Epitaxy and 11th Biennial Workshop on OMVPE and 3rd International Symposium on Lasers and Nonlinear Optical Materials
City	Keystone, Colorado
Period	20/07/03 → 24/07/03

NREL Publication Number

NREL/CP-520-33688

Cite this

@conference{162e257698ae4d7b9667ec60c205feee,

title = "Solid-Source Boron Doping of Float-Zoned Silicon",

author = "NREL",

year = "2003",

language = "American English",

note = "15th American Conference on Crystal Growth and Epitaxy and 11th Biennial Workshop on OMVPE and 3rd International Symposium on Lasers and Nonlinear Optical Materials ; Conference date: 20-07-2003 Through 24-07-2003",

}