Solution Deposition of Amorphous IZO Films by Ultrasonic Spray Pyrolysis

Robert Pasquarelli, Maikel Van Hest, Alexander Miedaner, Calvin Curtis, John Perkins, Joseph Berry, Ryan O'Hayre, David Ginley

Research output: Contribution to conferencePaperpeer-review

2 Scopus Citations


Atmospheric-pressure solution deposition of the transparent conducting oxide (TCO), amorphous indium-zinc oxide (α-IZO), was investigated as an alternative to traditional vacuum-based physical vapor deposition techniques for photovoltaic applications. Solution processing is attractive due to its ease and potential to lower device manufacturing costs. Here we report on α-IZO films prepared by ultrasonic spray pyrolysis from solutions of an indium-zinc formate (IZF) precursor. Thin, crack-free, amorphous IZO films with good optical transmittance (>75%) and conductivities of -34 S/cm were produced from an IZF-HNO3-methanol ink using joint RTP and Ar-H2 annealing.

Original languageAmerican English
Number of pages3
StatePublished - 2009
Event2009 34th IEEE Photovoltaic Specialists Conference, PVSC 2009 - Philadelphia, PA, United States
Duration: 7 Jun 200912 Jun 2009


Conference2009 34th IEEE Photovoltaic Specialists Conference, PVSC 2009
Country/TerritoryUnited States
CityPhiladelphia, PA

Bibliographical note

For preprint version, see NREL/CP-520-46016

NREL Publication Number

  • NREL/CP-520-44945


  • amorphous materials
  • chemical vapor deposition
  • conductive films
  • costs
  • manufacturing processes
  • optical films
  • photovoltaic systems
  • solar power generation
  • spraying
  • vacuum technology


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