Abstract
Atmospheric-pressure solution deposition of the transparent conducting oxide (TCO), amorphous indium-zinc oxide (α-IZO), was investigated as an alternative to traditional vacuum-based physical vapor deposition techniques for photovoltaic applications. Solution processing is attractive due to its ease and potential to lower device manufacturing costs. Here we report on α-IZO films prepared by ultrasonic spray pyrolysis from solutions of an indium-zinc formate (IZF) precursor. Thin, crack-free, amorphous IZO films with good optical transmittance (>75%) and conductivities of -34 S/cm were produced from an IZF-HNO3-methanol ink using joint RTP and Ar-H2 annealing.
Original language | American English |
---|---|
Pages | 309-311 |
Number of pages | 3 |
DOIs | |
State | Published - 2009 |
Event | 2009 34th IEEE Photovoltaic Specialists Conference, PVSC 2009 - Philadelphia, PA, United States Duration: 7 Jun 2009 → 12 Jun 2009 |
Conference
Conference | 2009 34th IEEE Photovoltaic Specialists Conference, PVSC 2009 |
---|---|
Country/Territory | United States |
City | Philadelphia, PA |
Period | 7/06/09 → 12/06/09 |
Bibliographical note
For preprint version, see NREL/CP-520-46016NREL Publication Number
- NREL/CP-520-44945
Keywords
- amorphous materials
- chemical vapor deposition
- conductive films
- costs
- manufacturing processes
- optical films
- photovoltaic systems
- solar power generation
- spraying
- vacuum technology