Abstract
Remarkably strong emission of terahertz radiation from illuminated GaAs microstructures on a Si substrate is reported. The peak-to-peak amplitude of terahertz radiation from the sample is 9 times larger than that of THz radiation from a semi-insulating GaAs wafer. The spectral width of the sample is larger than that of a semi-insulating GaAs wafer; in particular, the spectral amplitude increases at higher frequencies. The presented GaAs microstructures on a Si substrate can be suitable for practical and efficient THz sources required in various THz applications.
Original language | American English |
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Number of pages | 7 |
Journal | AIP Advances |
Volume | 8 |
Issue number | 12 |
DOIs | |
State | Published - 2018 |
NREL Publication Number
- NREL/JA-5K00-73196
Keywords
- epitaxy
- femtosecond lasers
- microstructural properties
- photoluminescence spectroscopy
- semiconductors
- terahertz radiation
- terahertz time-domain spectroscopy
- THz time-domain spectroscopy