Abstract
a-Si:H/c-Si heterojunction diodes were produced by PECVD with varying amorphous silicon layer thickness and hydrogen dilution of the gas phase. An accurate determination of the growth rate also in the initial stages of the deposition was made possible by an original chemical method based on the dissolution of the films followed by spectroscopical analysis of the obtained solution. The electricalcharacterization of the diodes confirms the generation - recombination - multitunneling nature of the transport. Although H2 dilution is important, however, beyond a certain level it is detrimental for the junction quality, probably due to the transition to a microcrystalline phase deposition. Solar cells were also produced, the best results being an open circuit voltage of 610 mV and anintrinsic efficiency of 14.2%.
Original language | American English |
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Pages | 45-50 |
Number of pages | 6 |
State | Published - 1996 |
Event | Amorphous Silicon Technology 1996: Materials Research Society Symposium - San Francisco, California Duration: 8 Apr 1996 → 12 Apr 1996 |
Conference
Conference | Amorphous Silicon Technology 1996: Materials Research Society Symposium |
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City | San Francisco, California |
Period | 8/04/96 → 12/04/96 |
NREL Publication Number
- NREL/CP-23015