Study of Aluminum Oxide Thin Films Prepared by Atmospheric-Pressure Chemical Vapor Deposition from Trimethylaluminum + Oxygen and/or Nitrous Oxide

    Research output: Contribution to journalArticle

    Original languageAmerican English
    Pages (from-to)509-517
    Number of pages9
    JournalJournal of Electronic Materials
    Issue number6
    StatePublished - 1988

    Bibliographical note

    Work performed by Department of Chemistry, Harvard University, Cambridge, Massachusetts

    NREL Publication Number

    • ACNR/JA-10706

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