@article{b0a1e43c84c54a19a9d3e611a63eb4e2,
title = "Study of Aluminum Oxide Thin Films Prepared by Atmospheric-Pressure Chemical Vapor Deposition from Trimethylaluminum + Oxygen and/or Nitrous Oxide",
author = "NREL",
note = "Work performed by Department of Chemistry, Harvard University, Cambridge, Massachusetts",
year = "1988",
doi = "10.1007/BF02652101",
language = "American English",
volume = "17",
pages = "509--517",
journal = "Journal of Electronic Materials",
issn = "0361-5235",
publisher = "Springer New York",
number = "6",
}