Substrate Heating Rates for Planar and Cylindrical-Post Magnetron Sputtering Sources

    Research output: Contribution to journalArticle

    Original languageAmerican English
    Pages (from-to)87-95
    Number of pages9
    JournalThin Solid Films
    Issue number1
    StatePublished - 1984

    Bibliographical note

    Work performed by Department of Metallurgy and Mining Engineering and Coordinated Science Laboratory, University of Illinois, Urbana, Illinois and Jet Propulsion Laboratory, California Institute of Technology, Pasadena, California

    NREL Publication Number

    • ACNR/JA-5758

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