@article{564f46ac43214764847c90767236bb76,
title = "Substrate Heating Rates for Planar and Cylindrical-Post Magnetron Sputtering Sources",
author = "NREL",
note = "Work performed by Department of Metallurgy and Mining Engineering and Coordinated Science Laboratory, University of Illinois, Urbana, Illinois and Jet Propulsion Laboratory, California Institute of Technology, Pasadena, California",
year = "1984",
doi = "10.1016/0040-6090(84)90160-3",
language = "American English",
volume = "119",
pages = "87--95",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier B.V.",
number = "1",
}