Substrate Temperature Dependence of Microcrystallinity in Plasma-Deposited, Boron-Doped Hydrogenated Silicon Alloys

    Research output: Contribution to journalArticle

    Original languageAmerican English
    Pages (from-to)1045-1047
    Number of pages3
    JournalApplied Physics Letters
    Issue number11
    StatePublished - 1983

    Bibliographical note

    Work performed by Division of Metallurgy and Materials Science, Brookhaven National Laboratory, Upton, NY

    NREL Publication Number

    • ACNR/JA-3674

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