Substrate Temperature Dependence of Microcrystallinity in Plasma-Deposited, Boron-Doped Hydrogenated Silicon Alloys

Research output: Contribution to journal › Article

Work performed by Division of Metallurgy and Materials Science, Brookhaven National Laboratory, Upton, NY

NREL Publication Number

@article{b5a97a17b40d4f679f82bb6c8d84bbea,

title = "Substrate Temperature Dependence of Microcrystallinity in Plasma-Deposited, Boron-Doped Hydrogenated Silicon Alloys",

author = "NREL",

note = "Work performed by Division of Metallurgy and Materials Science, Brookhaven National Laboratory, Upton, NY",

year = "1983",

doi = "10.1063/1.94230",

language = "American English",

volume = "43",

pages = "1045--1047",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "11",

}

TY - JOUR

T1 - Substrate Temperature Dependence of Microcrystallinity in Plasma-Deposited, Boron-Doped Hydrogenated Silicon Alloys

AU - NREL, null

N1 - Work performed by Division of Metallurgy and Materials Science, Brookhaven National Laboratory, Upton, NY

PY - 1983

Y1 - 1983

U2 - 10.1063/1.94230

DO - 10.1063/1.94230

M3 - Article

SN - 0003-6951

VL - 43

SP - 1045

EP - 1047

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 11

ER -