Superior Structural and Electronic Properties for Amorphous Silicon-Germanium Alloys Deposited by a Low Temperature Hot Wire Chemical Vapor Deposition Process

doi:10.1016/j.jnoncrysol.2005.10.057

Superior Structural and Electronic Properties for Amorphous Silicon-Germanium Alloys Deposited by a Low Temperature Hot Wire Chemical Vapor Deposition Process

Research output: Contribution to journal › Article › peer-review

Original language	American English
Pages (from-to)	1250-1254
Number of pages	5
Journal	Journal of Non-Crystalline Solids
Volume	352
Issue number	9-20
DOIs	https://doi.org/10.1016/j.jnoncrysol.2005.10.057
State	Published - 2006

NREL Publication Number

NREL/JA-520-40272

Access to Document

10.1016/j.jnoncrysol.2005.10.057

Cite this

@article{6a8f306ad5de4ca3a4ace77dc64f9a49,

title = "Superior Structural and Electronic Properties for Amorphous Silicon-Germanium Alloys Deposited by a Low Temperature Hot Wire Chemical Vapor Deposition Process",

author = "NREL",

year = "2006",

doi = "10.1016/j.jnoncrysol.2005.10.057",

language = "American English",

volume = "352",

pages = "1250--1254",

journal = "Journal of Non-Crystalline Solids",

issn = "0022-3093",

publisher = "Elsevier B.V.",

number = "9-20",

}

TY - JOUR

T1 - Superior Structural and Electronic Properties for Amorphous Silicon-Germanium Alloys Deposited by a Low Temperature Hot Wire Chemical Vapor Deposition Process

AU - NREL, null

PY - 2006

Y1 - 2006

U2 - 10.1016/j.jnoncrysol.2005.10.057

DO - 10.1016/j.jnoncrysol.2005.10.057

M3 - Article

SN - 0022-3093

VL - 352

SP - 1250

EP - 1254

JO - Journal of Non-Crystalline Solids

JF - Journal of Non-Crystalline Solids

IS - 9-20

ER -