Abstract
Surface analysis techniques have been used to investigate tin oxide-coated soda lime glass specimens prior and subsequent to their exposure to DC bias, heat, and humidity. All specimens reported here comprise the following layered structure: tin oxide/silicon oxycarbide/glass. Depth profiling using X-ray photoelectron spectroscopy (XPS) clearly shows the interfacial regions in both controlsamples and samples exposed to the above-mentioned conditions (stressed). Control samples show distinct and relatively compact interfacial regions as well as an intact silicon oxycarbide diffusion barrier. Stressed films, however, show more diffuse interfacial regions and a physically and chemically altered silicon oxycarbide diffusion barrier. This deterioration of the diffusion barrier isproposed to be a pre-requisite event to enable tin oxide delamination.
Original language | American English |
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Number of pages | 7 |
State | Published - 2003 |
Event | National Center for Photovoltaics (NCPV) and Solar Program Review Meeting - Denver, Colorado Duration: 24 Mar 2003 → 26 Mar 2003 |
Conference
Conference | National Center for Photovoltaics (NCPV) and Solar Program Review Meeting |
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City | Denver, Colorado |
Period | 24/03/03 → 26/03/03 |
NREL Publication Number
- NREL/CP-520-33602
Keywords
- delamination
- thin films
- transparent conducting oxides (TCO)
- x-ray photoelectron spectroscopy (XPS)