Surface Hydride Composition of Plasma-Synthesized Si Nanoparticles

Bhavin N. Jariwala; Nicolaas J. Kramer; M. Cristina Petcu; David C. Bobela; M. C.M.Van De Sanden; Paul Stradins; Cristian V. Ciobanu; Sumit Agarwal

doi:10.1021/jp2028005

Surface Hydride Composition of Plasma-Synthesized Si Nanoparticles

Bhavin N. Jariwala, Nicolaas J. Kramer, M. Cristina Petcu, David C. Bobela, M. C.M.Van De Sanden, Paul Stradins, Cristian V. Ciobanu, Sumit Agarwal

Chemistry and Nanoscience

Research output: Contribution to journal › Article › peer-review

37 Scopus Citations

Abstract

We have determined the surface hydride composition of amorphous and crystalline Si nanoparticles (NPs) (3-5 nm) synthesized in a low-temperature SiH₄/Ar plasma using in situ attenuated total reflection Fourier-transform infrared spectroscopy and H₂ thermal effusion measurements. With increasing power to the plasma source, the particles transition from amorphous to crystalline with a corresponding increase in the fraction of SiH species on the surface. The surface hydride composition indicates that Si NPs synthesized at higher plasma powers crystallize in the gas-phase due to a greater degree of plasma-induced heating, which enhances the desorption rates for SiH₂ and SiH₃. Furthermore, these Si NPs do not contain any detectable H in the bulk.

Original language	American English
Pages (from-to)	20375-20379
Number of pages	5
Journal	Journal of Physical Chemistry C
Volume	115
Issue number	42
DOIs	https://doi.org/10.1021/jp2028005 https://doi.org/10.1021/jp2028005
State	Published - 2011

NREL Publication Number

NREL/JA-5200-52789

Keywords

amorphous
crystalline
plasma synthesis
Si nanoparticles
SiHx
SiNP

Access to Document

Cite this

@article{a89b346538f945e298f71b97a4e619b4,

title = "Surface Hydride Composition of Plasma-Synthesized Si Nanoparticles",

abstract = "We have determined the surface hydride composition of amorphous and crystalline Si nanoparticles (NPs) (3-5 nm) synthesized in a low-temperature SiH4/Ar plasma using in situ attenuated total reflection Fourier-transform infrared spectroscopy and H2 thermal effusion measurements. With increasing power to the plasma source, the particles transition from amorphous to crystalline with a corresponding increase in the fraction of SiH species on the surface. The surface hydride composition indicates that Si NPs synthesized at higher plasma powers crystallize in the gas-phase due to a greater degree of plasma-induced heating, which enhances the desorption rates for SiH2 and SiH3. Furthermore, these Si NPs do not contain any detectable H in the bulk.",

keywords = "amorphous, crystalline, plasma synthesis, Si nanoparticles, SiHx, SiNP",

author = "Jariwala, {Bhavin N.} and Kramer, {Nicolaas J.} and Petcu, {M. Cristina} and Bobela, {David C.} and Sanden, {M. C.M.Van De} and Paul Stradins and Ciobanu, {Cristian V.} and Sumit Agarwal",

year = "2011",

doi = "10.1021/jp2028005",

language = "American English",

volume = "115",

pages = "20375--20379",

journal = "Journal of Physical Chemistry C",

issn = "1932-7447",

publisher = "American Chemical Society",

number = "42",

}

TY - JOUR

T1 - Surface Hydride Composition of Plasma-Synthesized Si Nanoparticles

AU - Jariwala, Bhavin N.

AU - Kramer, Nicolaas J.

AU - Petcu, M. Cristina

AU - Bobela, David C.

AU - Sanden, M. C.M.Van De

AU - Stradins, Paul

AU - Ciobanu, Cristian V.

AU - Agarwal, Sumit

PY - 2011

Y1 - 2011

N2 - We have determined the surface hydride composition of amorphous and crystalline Si nanoparticles (NPs) (3-5 nm) synthesized in a low-temperature SiH4/Ar plasma using in situ attenuated total reflection Fourier-transform infrared spectroscopy and H2 thermal effusion measurements. With increasing power to the plasma source, the particles transition from amorphous to crystalline with a corresponding increase in the fraction of SiH species on the surface. The surface hydride composition indicates that Si NPs synthesized at higher plasma powers crystallize in the gas-phase due to a greater degree of plasma-induced heating, which enhances the desorption rates for SiH2 and SiH3. Furthermore, these Si NPs do not contain any detectable H in the bulk.

AB - We have determined the surface hydride composition of amorphous and crystalline Si nanoparticles (NPs) (3-5 nm) synthesized in a low-temperature SiH4/Ar plasma using in situ attenuated total reflection Fourier-transform infrared spectroscopy and H2 thermal effusion measurements. With increasing power to the plasma source, the particles transition from amorphous to crystalline with a corresponding increase in the fraction of SiH species on the surface. The surface hydride composition indicates that Si NPs synthesized at higher plasma powers crystallize in the gas-phase due to a greater degree of plasma-induced heating, which enhances the desorption rates for SiH2 and SiH3. Furthermore, these Si NPs do not contain any detectable H in the bulk.

KW - amorphous

KW - crystalline

KW - plasma synthesis

KW - Si nanoparticles

KW - SiHx

KW - SiNP

UR - http://www.scopus.com/inward/record.url?scp=80054930447&partnerID=8YFLogxK

U2 - 10.1021/jp2028005

DO - 10.1021/jp2028005

M3 - Article

AN - SCOPUS:80054930447

SN - 1932-7447

VL - 115

SP - 20375

EP - 20379

JO - Journal of Physical Chemistry C

JF - Journal of Physical Chemistry C

IS - 42

ER -

Surface Hydride Composition of Plasma-Synthesized Si Nanoparticles

Abstract

NREL Publication Number

Keywords

Access to Document

Other files and links

Fingerprint

Cite this