Abstract
We have examined the influence of an incorporating surfactant on chemical ordering in GaAsN:Bi alloys. Epitaxy with a (2 × 1) reconstruction leads to the formation of GaAsN alloys, while the introduction of a Bi flux induces long-range chemical ordering of the {111} planes of GaAsN:Bi. We propose a mechanism in which Bi enhances the alignment of dimer rows along the [110] direction, facilitating N incorporation beneath surface dimers and Bi incorporation between dimer rows to form alternating N-rich and Bi-rich {111} planes. These findings suggest a route to tailoring the local atomic environment of N and Bi atoms in a wide range of emerging dilute nitride-bismide alloys.
Original language | American English |
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Article number | 211602 |
Number of pages | 5 |
Journal | Applied Physics Letters |
Volume | 113 |
Issue number | 21 |
DOIs | |
State | Published - 19 Nov 2018 |
Bibliographical note
Publisher Copyright:© 2018 Author(s).
NREL Publication Number
- NREL/JA-5K00-72462
Keywords
- chemical ordering
- dilute III-nitride bismide alloys
- III-V semiconductors