Abstract
ZnO thin films with significantly reduced band gaps were synthesized by doping N and codoping Al and N at 100 °C. All the films were synthesized by radiofrequency magnetron sputtering on F-doped tin-oxide-coated glass. We found that codoped ZnO: (Al,N) thin films exhibited significantly enhanced crystallinity compared with ZnO doped solely with N, ZnO:N, at the same growth conditions. Furthermore, annealed ZnO:(Al,N) thin films exhibited enhanced N incorporation over ZnO:N films. As a result, ZnO:(Al,N) films exhibited better photocurrents than ZnO:N films grown with pure N doping, suggesting that charge-compensated donor-acceptor codoping could be a potential method for band gap reduction of wide-band gap oxide materials to improve their photoelectrochemical performance.
Original language | American English |
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Pages (from-to) | 69-75 |
Number of pages | 7 |
Journal | Journal of Materials Research |
Volume | 25 |
Issue number | 1 |
DOIs | |
State | Published - 2010 |
NREL Publication Number
- NREL/JA-520-45859
Keywords
- energy generation
- grain size
- microstructure