Abstract
ZnO:N thin films with reduced bandgaps were synthesized by doping N in ZnO at 100°C followed by postdeposition annealing at 500°C in air for 2 h. All the films were synthesized by rf magnetron sputtering on F-doped tin oxide-coated glass. It is found that N doped ZnO :N thin films exhibited significantly enhanced crystallinity compared to ZnO at the same growth conditions. Furthermore, ZnO:N thin films showed enhanced N incorporation and shift the optical absorption into the visible light regions. As a result, ZnO:N films showed improved PEC response, compared to ZnO thin films.
Original language | American English |
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Pages | 259-267 |
Number of pages | 9 |
State | Published - 2010 |
Event | Materials Science and Technology Conference and Exhibition 2010, MS and T'10 - Houston, TX, United States Duration: 17 Oct 2010 → 21 Oct 2010 |
Conference
Conference | Materials Science and Technology Conference and Exhibition 2010, MS and T'10 |
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Country/Territory | United States |
City | Houston, TX |
Period | 17/10/10 → 21/10/10 |
NREL Publication Number
- NREL/CP-5200-51622
Keywords
- Band gap
- Crystallinity
- Doping
- Gas ambient
- N concentration
- Photoelectrochemical
- RF power
- Sputter
- Substrate temperature
- ZnO