Temperature Dependence of the Photoinduced Degradation and Annealing in a-Si:H

Temperature Dependence of the Photoinduced Degradation and Annealing in a-Si:H

Research output: Contribution to conference › Paper

Original language	American English
Pages	A3.4.1-A3.4.6
State	Published - 2001
Event	Amorphous and Heterogeneous Silicon Thin Films 2000: Materials Research Society Symposium - San Francisco, California Duration: 24 Apr 2000 → 28 Apr 2000

Conference

Conference	Amorphous and Heterogeneous Silicon Thin Films 2000: Materials Research Society Symposium
City	San Francisco, California
Period	24/04/00 → 28/04/00

Bibliographical note

Work performed by University of Utah, Salt Lake City, Utah

NREL Publication Number

NREL/CP-520-30438

Cite this

@conference{7aeec401c73a4318bd9e1692a73e0bbd,

title = "Temperature Dependence of the Photoinduced Degradation and Annealing in a-Si:H",

author = "NREL",

note = "Work performed by University of Utah, Salt Lake City, Utah; Amorphous and Heterogeneous Silicon Thin Films 2000: Materials Research Society Symposium ; Conference date: 24-04-2000 Through 28-04-2000",

year = "2001",

language = "American English",

pages = "A3.4.1--A3.4.6",

}