Textured Fluorine-Doped ZnO Films by Atmospheric Pressure Chemical Vapor Deposition and Their Use in Amorphous Silicon Solar Cells

Research output: Contribution to journal › Article

Work performed by Department of Chemistry, Harvard University, Cambridge, Massachusetts

NREL Publication Number

@article{baea0f61d6284d5bbfc0ac59d744ed82,

title = "Textured Fluorine-Doped ZnO Films by Atmospheric Pressure Chemical Vapor Deposition and Their Use in Amorphous Silicon Solar Cells",

author = "NREL",

note = "Work performed by Department of Chemistry, Harvard University, Cambridge, Massachusetts",

year = "1991",

doi = "10.1016/0379-6787(91)90076-2",

language = "American English",

volume = "30",

pages = "437--450",

journal = "Solar Cells",

issn = "0379-6787",

publisher = "Elsevier BV",

number = "Complete",

}

TY - JOUR

T1 - Textured Fluorine-Doped ZnO Films by Atmospheric Pressure Chemical Vapor Deposition and Their Use in Amorphous Silicon Solar Cells

AU - NREL, null

N1 - Work performed by Department of Chemistry, Harvard University, Cambridge, Massachusetts

PY - 1991

Y1 - 1991

U2 - 10.1016/0379-6787(91)90076-2

DO - 10.1016/0379-6787(91)90076-2

M3 - Article

SN - 0379-6787

VL - 30

SP - 437

EP - 450

JO - Solar Cells

JF - Solar Cells

IS - Complete

ER -