Abstract
There have been a number of studies on the fabrication of Sn-doped gallium oxide (Ga2O3:Sn) films with both conductive and transparent properties using a variety of deposition methods. However, often, synthesis results in films that are not transparent. In this paper, we examine the mechanisms underlying these results in Ga2O3:Sn thin films prepared at various growth temperatures, Sn concentrations, and oxygen partial pressures. With X-ray absorption spectroscopy, transmission electron microscopy and energy dispersive spectroscopy, we find that when films are grown under the oxygen deficient conditions there are Ga sub-oxide and SnOx phases in the Ga2O3:Sn thin film. These Ga sub-oxide phases are only found in non-transparent films, and so we infer that the Ga sub-oxide is responsible for the non-transparency. These observations suggest that to obtain transparent Ga2O3:Sn, films deposition or subsequent annealing must be carefully controlled in both temperature and oxygen partial pressure to avoid the formation of Ga sub-oxide phases.
Original language | American English |
---|---|
Article number | Article No. 141909 |
Number of pages | 5 |
Journal | Applied Physics Letters |
Volume | 109 |
Issue number | 14 |
DOIs | |
State | Published - 3 Oct 2016 |
Bibliographical note
Publisher Copyright:© 2016 Author(s).
NREL Publication Number
- NREL/JA-5K00-67389
Keywords
- extended X-ray absorption fine structure spectroscopy
- thin film growth
- transmission electron microscopy
- X-ray absorption near edge structure
- X-ray absorption spectroscopy