Effect of the Film H Content on the Crystallizaiton of Laser Processed and Thermally Annealed HWCVD a-Si:H

A.H. Mahan

    Research output: Contribution to journalArticlepeer-review

    Original languageAmerican English
    Pages (from-to)596-599
    Number of pages4
    JournalPhysica Status Solidi (C) Current Topics in Solid State Physics
    Volume7
    Issue number3-4
    DOIs
    StatePublished - 2010

    NREL Publication Number

    • NREL/JA-520-48842

    Keywords

    • hot-wire chemical vapor deposition
    • HWCVD
    • silicon thin films

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